The SPIE, the International Society for Optics and Photonics, Advanced Lithography + Patterning #SPIElitho, took place in San Jose, California, from 25-29 February. It is the event for the lithography community, both academics and industry to meet and discuss latest trends and future developments.
One of this year’s topics was sustainability and how the community can work on decreasing their carbon, but also PFAS footprint.
At the conference, NGM partner Micro Resist Technology GmbH presented its latest research results and their innovative company.
